| 摘要 |
<p>A silicon crystallizing device includes a laser beam source emitting a laser beam, a projector unit converging and changing a pattern of the laser beam from the laser beam source, a stage loading/unloading a substrate, a mirror deflecting the laser beam from the projector unit to an outside of the substrate, and a cooling device receiving the laser beam deflected by the mirror and sinking heat generated by the laser beam received, thereby warming up the projection lens before completion of loading the substrate, or cutting off laser beam incident on the substrate after crystallization of the substrate.</p> |
