发明名称 LITHOGRAPHIC APPARATUS, METHOD OF DETERMINING MODEL PARAMETER, METHOD OF MANUFACTURING DEVICE, AND DEVICE MANUFACTURED THEREBY
摘要 PROBLEM TO BE SOLVED: To provide a method of determining a position of an object and a lithographic projection apparatus. SOLUTION: A method according to an embodiment of the present invention relates to determining at least one parameter of a model providing information on a position of an object. The object has a plurality of alignment marks clarifying a determined position. The method includes determining a plurality of positional parameters of each alignment mark. The positional parameters are weighted by a weighting factor and measured, and based on the plurality of positional parameters thus obtained, at least one parameter of the model of the object is determined. A numeric value of each weighting factor is determined with at least one parameter of the model. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005175487(A) 申请公布日期 2005.06.30
申请号 JP20040355504 申请日期 2004.12.08
申请人 ASML NETHERLANDS BV;INTERUNIV MICRO ELEKTRO CENTRUM VZB 发明人 VAN DER SCHAAR MAURITS;HUIJBREGTSE JEROEN;SCHETS SICCO IAN;SWINNEN BART L
分类号 G03F9/00;G03B27/00;G03C5/00;G03C8/00;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 G03F9/00
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