发明名称 |
Method for fabricating nano pore |
摘要 |
Provided is a method for fabricating a nanoscale pore which has been researched in a molecular electronics field of chemistry and in a molecular dynamics field of biology, wherein a oxidation pattern is selectively formed on a thin mask layer by anodic nano-oxidation using an AFM, and the oxidation pattern is selectively etched, thereby fabricating the nanoscale pore. Thus, the present invention provides a simple and easy method for fabricating nano pore array.
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申请公布号 |
US2005142298(A1) |
申请公布日期 |
2005.06.30 |
申请号 |
US20040898319 |
申请日期 |
2004.07.26 |
申请人 |
KIM JUN HO;PARK KANG H.;SONG KI B.;KIM EUN K.;LEE SUNG Q. |
发明人 |
KIM JUN HO;PARK KANG H.;SONG KI B.;KIM EUN K.;LEE SUNG Q. |
分类号 |
G03F7/00;B05D3/00;B05D7/00;C25D11/02;(IPC1-7):B05D3/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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