| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for processing a workpiece in a chamber where chamber pressure arises from supply of a reactive gas into the chamber. SOLUTION: The method for processing a workpiece in a chamber where chamber pressure arises from supply of a reactive gas into the chamber includes a step for arranging the workpiece on a holder in the chamber so that a first face of the workpiece is exposed to the reactive gas, a step for supplying an unreactive gas to the holder and a second face of the workpiece, and a step for controlling differential gas pressure over the thickness of the workpiece. COPYRIGHT: (C)2005,JPO&NCIPI
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