APPARATUS FOR AND METHOD OF COOLING AND POSITIONING A TRANSLATING SUBSTRATE TAPE FOR USE WITH A CONTINUOUS VAPOR DEPOSITION PROCESS

摘要

The present invention is an apparatus for and method of cooling and positioning a translating substrate tape during a continuous high-throughput deposition process such as IBAD that is characterized by a long deposition zone where the substrate tape comes into contact with a substrate assembly as it translates the length of the deposition zone. A chilled liquid passes through the substrate assembly, maintaining the temperature of the substrate assembly below a specified level. Also passing through the substrate assembly is an inert gas that exits at an interface between the translating tape and the substrate assembly.