| 摘要 |
PROBLEM TO BE SOLVED: To inspect the existence of contaminations on the exposed surface of an exposed object which is processed in a lithography process, correctly with high throughput without damaging the exposed surface of the exposed object. SOLUTION: A contamination inspection apparatus for inspecting the existence of contaminations on the exposed surface 7a of the exposed object 7 whereon a pattern is to be transferred using a mask for exposure comprises a beam irradiation means 11 and 12 for irradiating beams 13 in parallel to the exposed surface 7a, and a foreign matter detection means 14 and 15 which detects a foreign matter 16 existing on the exposed surface 7a by measuring scattered light and a shaded amount of the beams 13. A distance from the exposed surface 7a at the time of irradiating the beams 13 is set based on a gap between the mask for exposure and the exposed surface 7a. COPYRIGHT: (C)2005,JPO&NCIPI
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