发明名称 LITHOGRAPHIC SYSTEM, PROGRAM AND INFORMATION RECORDING MEDIUM, SUPPORT DEVICE AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To enable distortion matching between an original process and a current process even in the case of many-kind small-quantity production or the like in which a lot is divided after intermediate processes. SOLUTION: A host 160 controlling a plurality of projection aligners 110<SB>1</SB>to 110<SB>N</SB>controls even original process information containing an image distortion correction value used in the case of the exposure of the original process. An arithmetic unit 130 computes adaptive devices using the difference of an image distortion between the original process and the current process as an allowable value and the image-distortion correction value in response to an inquiry from the host containing at least a part of the original-process information, and answers the information of the result of the computation to the host. Accordingly, the distortion matching between the original process and the current process by the selected projection aligner is enabled by imparting the image-distortion correction value by selecting one adaptive device without depending upon the discriminating information of the lot by the host. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005174959(A) 申请公布日期 2005.06.30
申请号 JP20030408097 申请日期 2003.12.05
申请人 NIKON CORP 发明人 AKIZUKI MASAHIKO
分类号 G03F7/20;H01L21/02;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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