发明名称 Laser treatment apparatus
摘要 A laser treatment apparatus for performing treatment by irradiating an affected part with a laser beam comprises: a laser source capable of emitting beams of a plurality of different wavelengths; a first setting unit which sets an irradiation amount of a laser beam for treatment of a wavelength to be used for treatment; an emission amount changing unit which changes an emission amount of the beam in plural levels; an attenuating unit which attenuates the beam emitted by the laser source; and a control part which controls the emission amount changing unit and the attenuating unit based on the set irradiation amount of the treatment beam.
申请公布号 US2005143720(A1) 申请公布日期 2005.06.30
申请号 US20040016960 申请日期 2004.12.21
申请人 NIDEK CO., LTD. 发明人 YAMADA TSUYOSHI;HAYASHI KENICHI;NAITO YASUYUKI;TOMITA SEIKI
分类号 A61B18/20;A61F9/007;A61N5/06;(IPC1-7):A61B18/20 主分类号 A61B18/20
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