发明名称 |
Laser treatment apparatus |
摘要 |
A laser treatment apparatus for performing treatment by irradiating an affected part with a laser beam comprises: a laser source capable of emitting beams of a plurality of different wavelengths; a first setting unit which sets an irradiation amount of a laser beam for treatment of a wavelength to be used for treatment; an emission amount changing unit which changes an emission amount of the beam in plural levels; an attenuating unit which attenuates the beam emitted by the laser source; and a control part which controls the emission amount changing unit and the attenuating unit based on the set irradiation amount of the treatment beam.
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申请公布号 |
US2005143720(A1) |
申请公布日期 |
2005.06.30 |
申请号 |
US20040016960 |
申请日期 |
2004.12.21 |
申请人 |
NIDEK CO., LTD. |
发明人 |
YAMADA TSUYOSHI;HAYASHI KENICHI;NAITO YASUYUKI;TOMITA SEIKI |
分类号 |
A61B18/20;A61F9/007;A61N5/06;(IPC1-7):A61B18/20 |
主分类号 |
A61B18/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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