| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner which, when a projection optical system of a numerical aperture (NA) is used (for example, a liquid immersion type or 1<NA), an accurate alignment is realized without enlarging the device and an exposure with excellent resolution can be performed. SOLUTION: The aligner performs imaging of a pattern formed in a reticle to a material to be treated by using a projection optical system. The aligner includes a reference mark used as the reference of alignment of the reticle and the material to be treated, a first liquid having a refractive index larger than "1" which fills between at least the part of the projection optical system and the material to be treated and between at least the part of the projection optical system and the reference mark, and an alignment mechanism for aligning the material to be treated by using the projection optical system and the liquid. COPYRIGHT: (C)2005,JPO&NCIPI
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