发明名称 |
Clamshell and small volume chamber with fixed substrate support |
摘要 |
Embodiments of the present invention generally relate to a small volume chamber with a substrate support. One embodiment of a processing chamber includes a first assembly having a substrate support, a pumping ring disposed around a perimeter of the substrate receiving surface, and a gas distribution assembly disposed over the substrate support. The chamber may further include a gas distribution assembly disposed over the substrate support. The first assembly and the gas distribution assembly can be selectively positioned between an open position and a closed position.
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申请公布号 |
US2005139160(A1) |
申请公布日期 |
2005.06.30 |
申请号 |
US20050059846 |
申请日期 |
2005.02.16 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LEI LAWRENCE C.;MAK ALFRED W.;TZU GWO-CHUAN;TEPMAN AVI;XI MING;GLENN WALTER B. |
分类号 |
C23C16/44;C23C16/455;H01L21/00;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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