REAL TIME IMAGE RESIZING FOR DYNAMIC DIGITAL PHOTOLITHOGRAPHY

摘要

A dynamic photolithography system (100) resizes a pattern (410) in real time and photolithographically transfers an image of the resized pattern (510) onto a surface (150) to compensate for distortions in the surface (150) and/or optics (114). The system (100) uses two or more pre-stored spatially offset renderings (400a...400N) of the pattern (410). Each spatially offset rendering (400a...400N) includes pixel data identifying light modulation elements (210) within a spatial light modulator (110) representing the pattern (410). The pattern (410) is spatially offset between the renderings (400a...400N). Portions of the two or more spatially offset renderings (400a...400N) are selected as a function of the distortion to resize the pattern (410) and photolithographically transfer the image of the resized pattern (510) onto the surface (150).