发明名称 TRANSPARENT HIGH-GAS-BARRIER BASE AND METHOD FOR PRODUCING SAME
摘要 <p>A transparent high barrier film with high gas barrier performance and excellent environmental durability, whose gas barrier performance is not deteriorated even when the film is bent, can be produced at high productivity. A method for producing a base having at least an organic layer and an inorganic layer on a support is characterized in that the inorganic layer is formed by supplying a gas containing a film-forming gas into a discharge space, applying a high-frequency electric field to the discharge space for exciting the gas, and exposing the base to the excited gas at or near atmospheric pressure. The method for producing a base is further characterized in that the high-frequency electric field is obtained by superposing a first high-frequency electric field and a second high-frequency electric field, the frequency (omega2) of the second high-frequency electric field is higher than the frequency (omega1) of the first high-frequency electric field, the relation among the strength (V1) of the first high-frequency electric field, the strength (V2) of the second high-frequency electric field, and the breakdown electric field strength (IV) satisfies V1 >= IV > V2 or V1 > IV >= V2, and the power density of the second high-frequency electric field is not less than 1 W/cm<2>.</p>
申请公布号 WO2005059203(A1) 申请公布日期 2005.06.30
申请号 WO2004JP18323 申请日期 2004.12.02
申请人 KONICA MINOLTA HOLDINGS, INC.;TSUJI, TOSHIO;FUKUDA, KAZUHIRO 发明人 TSUJI, TOSHIO;FUKUDA, KAZUHIRO
分类号 C23C16/509;H05H1/24;(IPC1-7):C23C16/509;C23C16/52;B32B9/00;H05B33/02;H05B33/14 主分类号 C23C16/509
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