POLYMER SOLUTION FOR RESIST AND METHOD FOR PREPARING SAME

摘要

PROBLEM TO BE SOLVED: To supply a polymer for a resist free of impurities used in fine pattern formation and to provide a method for producing the polymer for a resist.

SOLUTION: In the polymer solution for a resist obtained by dissolving the polymer for a resist including a repeating unit which is decomposed by the action of an acid and becomes alkali-soluble and a repeating unit containing a polar group in a solvent for film formation, the amount of impurities whose boiling points are below the boiling point of the solvent for film formation is ≤1 mass% of the amount of the polymer for a resist. The method for preparing the polymer solution for a resist includes a redissolution step (1) of redissolving a solid material containing a polymer for a resist in a solvent comprising at least one solvent (a) which is a solvent for image formation and a solvent (b) whose boiling point under ordinary pressure is below the boiling point of the solvent (a); and an impurity removing step (2) of distilling the solvent (b) under reduced pressure out of a solution obtained by redissolution in the step (1).

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