| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist composition which suppresses line edge roughness and residue on development while retaining high resolution. <P>SOLUTION: The photoresist composition contains (A) a polymer component including an alkali-soluble constitutional unit having an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl group, and having alkali solubility changed by the action of an acid; and (B) an acid generator component which generates an acid when it receives exposure light, and contains at least (B-1) an onium salt having C<SP>-</SP>(SO<SB>2</SB>C<SB>n</SB>F<SB>2n+1</SB>)<SB>3</SB>(n is an integer of 1-5) as an anion moiety. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
