| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition for liquid immersion exposure process, the composition suitable to be used for liquid immersion exposure process, to provide a method for forming a resist pattern by using the composition, and in particular, to provide a resist composition for liquid immersion exposure process suitable when the liquid used for the liquid immersion exposure process is water, and a method for forming a resist pattern by using the above composition. <P>SOLUTION: The following copolymer resin is used for the resist composition for liquid immersion exposure process. The copolymer is characterized in that: it contains a unit (a) derived from a dicarboxylic acid anhydride; and the proportion of the unit (a) is ≤30 mol% in the entire base polymer. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
