SUBSTRATE HOLDING DEVICE, EXPOSURE DEVICE USING THE SAME, AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate holding technology which suppresses intruding of a liquid immersion liquid to the rear surface of a substrate. SOLUTION: The substrate holding device 5C for holding the substrate in contact with the rear surface of the substrate 12 dipped in the liquid includes a chuck means 5D for attracting the substrate, and a suppressing means 17 for suppressing the intruding of the liquid in between the rear surface of the substrate and the chuck means 5D. COPYRIGHT: (C)2005,JPO&NCIPI