发明名称 NONVOLATILE MEMORY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile memory device wherein, when performing a non-defective selecting test in the case of its shipping from a semiconductor factory, its cost-down is made possible by the contraction of its testing time. SOLUTION: The nonvolatile memory device 1 has a plurality of kinds of memory-cells. Each memory-cell portion has a source region 12, a base region 13, and a drain region 14 formed successively on the surface of a semiconductor substrate, a floating gate 17 formed thereabove via a gate insulation film and a tunnel insulation film 16a or via a gate insulation film and a tunnel insulation film 16b, and a control gate 19 formed thereabove via an interlayer insulation film. Further, the memory-cells have a first memory cell 2a wherein the area of its tunnel insulation film 16a contacted with its drain region 14 is made small and a second memory cell 2b wherein the area of its tunnel insulation film 16b contacted with its drain region 14 is made large. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005175326(A) 申请公布日期 2005.06.30
申请号 JP20030415768 申请日期 2003.12.12
申请人 ROHM CO LTD 发明人 MASAGO NORIYUKI;TADA YOSHIHIRO
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L21/8247
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