| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing an MRAM consuming less power for recording. SOLUTION: The MRAM manufacturing method comprises a step of etching a magnetoresistive film 220 by using a mask pattern 961, a step of fabricating an insulating film and then a metal film on the whole surface after the etching step, and a step of removing the mask pattern 961 and the insulating film and the metal film that are on the mask pattern 961. COPYRIGHT: (C)2005,JPO&NCIPI
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