发明名称 |
Pattern analysis method and pattern analysis apparatus |
摘要 |
A pattern analysis method includes: a first step of preparing pattern layout data including a plurality of first regions and a plurality of second regions; a second step of selecting either said plurality of first regions or said plurality of second regions as a target region in which a critical area of said pattern layout data is to be calculated; and a third step of extracting, from said target region, rectangular regions each having a width within a given range. The method further includes; a fourth step of obtaining a total area of said rectangular regions; and a fifth step of calculating said critical area by using said total area.
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申请公布号 |
US2005141764(A1) |
申请公布日期 |
2005.06.30 |
申请号 |
US20040995356 |
申请日期 |
2004.11.24 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
TOHYAMA YOKO;ITO MITSUMI |
分类号 |
G06F17/50;G06K9/00;G06K9/46;H01L21/82;H01L27/02;(IPC1-7):G06K9/00 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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