发明名称 Pattern analysis method and pattern analysis apparatus
摘要 A pattern analysis method includes: a first step of preparing pattern layout data including a plurality of first regions and a plurality of second regions; a second step of selecting either said plurality of first regions or said plurality of second regions as a target region in which a critical area of said pattern layout data is to be calculated; and a third step of extracting, from said target region, rectangular regions each having a width within a given range. The method further includes; a fourth step of obtaining a total area of said rectangular regions; and a fifth step of calculating said critical area by using said total area.
申请公布号 US2005141764(A1) 申请公布日期 2005.06.30
申请号 US20040995356 申请日期 2004.11.24
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 TOHYAMA YOKO;ITO MITSUMI
分类号 G06F17/50;G06K9/00;G06K9/46;H01L21/82;H01L27/02;(IPC1-7):G06K9/00 主分类号 G06F17/50
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