发明名称 |
Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris |
摘要 |
A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.
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申请公布号 |
US2005140945(A1) |
申请公布日期 |
2005.06.30 |
申请号 |
US20030748851 |
申请日期 |
2003.12.31 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BANINE VADIM Y.;BAKKER LEVINUS P.;IVANOV VLADIMIR V.;JOSEPHINA MOORS JOHANNES H.;ZUKAVISHVILI GIVI G.;VEEFKIND ABRAHAM |
分类号 |
G03F7/20;(IPC1-7):G03B27/52 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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