MANUFACTURING METHOD FOR PHOTO MASK,申请号KR20030096924-传众专利搜索

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发明名称	MANUFACTURING METHOD FOR PHOTO MASK
摘要
申请公布号	KR20050065156(A)	申请公布日期	2005.06.29
申请号	KR20030096924	申请日期	2003.12.24
申请人	HYNIX SEMICONDUCTOR INC.	发明人	JEONG, KU CHEOL
分类号	G03F1/80;G03F7/26;(IPC1-7):G03F1/08	主分类号	G03F1/80
代理机构		代理人
主权项
地址

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