发明名称 |
Processing of semiconductor components with dense processing fluids and ultrasonic energy |
摘要 |
Method for processing an article with a dense processing fluid in a processing chamber while applying ultrasonic energy during processing. The dense fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. A processing agent may be added to the pressurization vessel, to the processing chamber, or to the dense fluid during transfer from the pressurization vessel to the processing chamber. The ultrasonic energy may be generated continuously at a constant frequency or at variable frequencies. Alternatively, the ultrasonic energy may be generated intermittently. <IMAGE>
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申请公布号 |
EP1548810(A2) |
申请公布日期 |
2005.06.29 |
申请号 |
EP20040029210 |
申请日期 |
2004.12.09 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
MCDERMOTT, WAYNE THOMAS;SUBAWALLA, HOSHANG;JOHNSON, ANDREW DAVID;SCHWARZ, ALEXANDER |
分类号 |
B01J3/00;B01J19/10;B08B3/08;B08B3/12;B08B7/00;C11D7/24;C11D7/26;C11D7/32;C11D7/50;C11D11/00;G03F1/00;H01L21/00;H01L21/304;H01L21/306;H01L21/311;(IPC1-7):H01L21/306 |
主分类号 |
B01J3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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