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发明名称
HIGH-PURITY ALKALI ETCHING SOLUTION FOR SILICON WAFER AND ALKALI ETCHING METHOD OF SILICON WAFER
摘要
申请公布号
KR20050063733(A)
申请公布日期
2005.06.28
申请号
KR20040110308
申请日期
2004.12.22
申请人
SILTRONIC AG
发明人
NISHIMURA SHIGEKI
分类号
H01L21/308;H01L21/306;H01L21/3063;(IPC1-7):H01L21/306
主分类号
H01L21/308
代理机构
代理人
主权项
地址
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