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发明名称
METHOD FOR FORMING A PHOTORESIST PATTERN IN A SEMICONDUCTOR DEVICE PROCESSING
摘要
申请公布号
KR20050063063(A)
申请公布日期
2005.06.28
申请号
KR20030094116
申请日期
2003.12.19
申请人
HYNIX SEMICONDUCTOR INC.
发明人
NAM, KI WON
分类号
H01L21/027;(IPC1-7):H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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