PHOTORESIST POLYMER AND PHOTORESIST COMPOSITION CONTAINING IT,申请号KR20030094611-传众专利搜索

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发明名称	PHOTORESIST POLYMER AND PHOTORESIST COMPOSITION CONTAINING IT
摘要
申请公布号	KR20050063234(A)	申请公布日期	2005.06.28
申请号	KR20030094611	申请日期	2003.12.22
申请人	HYNIX SEMICONDUCTOR INC.	发明人	LEE, GEUN SU
分类号	G03F7/039;(IPC1-7):G03F7/039	主分类号	G03F7/039
代理机构		代理人
主权项
地址

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