LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A lithographic apparatus includes an illumination system for projecting a beam of radiation onto a substrate. The lithographic apparatus further has a chuck assembly (100) for supporting at least one of the substrate (W) or a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. A heat transfer system (151-158) is operable between a first surface (1100) and a second surface (1300). The heat transfer system is capable of transferring heat between the first surface and the second surface. The first surface is at least partially formed by at least a part of the chuck assembly. The second surface is at least partially formed by at least a part of a component (130) spaced a distance from the chuck. The second surface is mechanically isolated from and thermally coupled to the first surface.