发明名称 Methods of forming aligned structures with radiation-sensitive material
摘要 The invention encompasses a radiation-patterning tool. The tool is configured to be utilized to print a pair of structures in a radiation-sensitive material. The tool includes two separate and discrete features, with one of the features corresponding to one of the structures of the pair of structures and the other of the two features correspond to the other of the structures. At least one element is between the features. The at least one element is at least partially transparent to radiation passing through the radiation-patterning tool, but does not correspond to a discrete structure printed in the radiation-sensitive material. The element modifies the structures printed from the pair of features. The invention also includes printing methods and methods of forming aligned structures with radiation-sensitive material.
申请公布号 US6911301(B2) 申请公布日期 2005.06.28
申请号 US20040808703 申请日期 2004.03.24
申请人 MICRON TECHNOLOGY, INC. 发明人 DULMAN H. DANIEL;STANTON WILLIAM A.
分类号 G03C5/00;G03F1/00;G03F1/14;G03F7/20;G03F7/40;G03F9/00;(IPC1-7):G03C5/00 主分类号 G03C5/00
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