发明名称 Method for cutting semiconductor wafer protecting sheet
摘要 To cut a protecting sheet adhered over the obverse of a wafer, an inclination angle of a cutting tool is adjusted according to a form of a chamfered part of the wafer and a finishing thickness of the wafer so that the protecting sheet is cut into the required minimum size for protecting the obverse of the wafer. Thus, the protecting sheet is not included inside a removed portion in a grinding process of the reverse of the wafer with a grindstone even if the wafer is ground to have extremely thin finishing thickness. Hence, the protecting sheet is not ground while the reverse of the wafer is ground, and the grindstone is thus prevented from being clogged up with ground material of the protecting sheet.
申请公布号 US6910403(B1) 申请公布日期 2005.06.28
申请号 US20000587281 申请日期 2000.06.05
申请人 TOKYO SEIMITSU CO., LTD. 发明人 ISHIKAWA TOSHIHIKO;KATAGIRI YASUSHI
分类号 H01L21/304;H01L21/301;H01L21/68;H01L21/78;(IPC1-7):H01L21/304 主分类号 H01L21/304
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