| 发明名称 |
MEMBER WHICH INCLUDES POROUS SILICON REGION, AND METHOD OF MANUFACTURING MEMBER WHICH CONTAINS SILICON |
| 摘要 |
|
| 申请公布号 |
KR20050063709(A) |
申请公布日期 |
2005.06.28 |
| 申请号 |
KR20040109293 |
申请日期 |
2004.12.21 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
IKEDA HAJIME;SAKAGUCHI KIYOFUMI;SATO NOBUHIKO |
| 分类号 |
H01L21/20;H01L21/02;H01L21/306;H01L21/762;H01L27/12;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
