| 摘要 |
PROBLEM TO BE SOLVED: To simplify a manufacture process and to manufacture a stable cell projection mask. SOLUTION: This manufacturing method of the cell projection mask 40 comprises a step for forming a membrane 32 on a supporting substrate 30, a step for forming a metal layer 34 of superior electron infiltration prevention ability on the membrane, the stage for forming a first photosensitive film pattern 36 on the metal layer so as to expose a part of the metal layer, a step for utilizing the first photosensitive film pattern as an etching mask, patterning the metal layer and forming an absorption layer 35, a step for removing the first photosensitive film pattern 36, a step for forming a second photosensitive film pattern 38 for exposing the center part of the back surface of the supporting substrate on the back surface of the supporting substrate, a step for turning the second photosensitive film pattern to the etching mask, etching the exposed part of the back surface of the supporting substrate, until the membrane is exposed and forming a frame 31, and a step for removing the second photosensitive film pattern 38. |
