发明名称 Semiconductor component incorporating some zones of high concentration of atoms of a metal such as platinum or gold, notably to produce a rapid diode
摘要 Structure formed in a semiconductor substrate (10) incorporates at least one zone (11) having an elevated concentration of atoms of a metal such as platinum or gold. This zone is surrounded by at least a first trench (T1,T2,T3,T4) penetrating into the substrate. An independent claim is also included for the formation of this zone in a semiconductor substrate.
申请公布号 FR2864344(A1) 申请公布日期 2005.06.24
申请号 FR20030051111 申请日期 2003.12.18
申请人 STMICROELECTRONICS SA 发明人 DUCREUX GERARD
分类号 H01L21/22;H01L29/06;H01L29/32;H01L29/861 主分类号 H01L21/22
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