PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC

摘要

The dimensional changes of patterns formed from polysilsesquiazane- based photosensitive compositions containing a photo-acid generator are prevented. Provided is a photosensitive composition characterized by comprising: a modified polysilsesquiazane which has basic structural units represented by the general formula -[SiR1(NR2) 1.5]- (wherein R1's each independently represents C1- 3 alkyl or (un)substituted phenyl; and R2's each independently represents hydrogen, C1-3 alkyl, or (un)substituted phenyl), up to 50 mol% of the basic structural units being substituted by groups other than silazane bonds, and has a weight-average molecular weight of 500 to 200,000; a photo-acid generator; and a basic substance.