发明名称 EXPOSURE MASK, ITS MANUFACTURING METHOD AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure mask for forming a three-dimensional figure by exposure, the mask having a simple structure and giving a sufficient number of gray scales. <P>SOLUTION: In the exposure mask M to be used for an exposure apparatus S, a plurality of pattern blocks comprising a pair of a light blocking pattern to block light emitting from the exposure apparatus S and a transmissive pattern to transmit the light are continuously arranged in such a manner that the pitch of the continuous pattern blocks is constant while a ratio of the light blocking pattern to the transmissive pattern is gradually varied. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005165248(A) 申请公布日期 2005.06.23
申请号 JP20040007624 申请日期 2004.01.15
申请人 SONY CORP 发明人 OZAWA KEN
分类号 G02B5/00;G02B3/00;G03F1/68;G03F1/70 主分类号 G02B5/00
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