| 摘要 |
In a method for producing an optical unit having an optical element deviating from a circular shape, for an optical imaging system, in particular for a projection objective in semiconductor lithography in the EUV region, a supporting part is provided, which is provided with reference surfaces for adjustment in the optical system, in accordance with which the optical element is connected to the supporting part. Subsequently, there is fixed relative to the optical element a zero point which forms a reference point with a zero point fixed in the optical system during installation of the optical unit in the optical system.
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