| 摘要 |
PROBLEM TO BE SOLVED: To provide a micro nano pattern structure of effectively forming a continuous ultrafine pattern composed of an unltrafine particle, and also to provide its advantageous manufacturing method. SOLUTION: This micro nano pattern structure is constituted by arranging an ultrafine pattern 12 composed of a film-like connecting part 20 formed on a base board 10 corresponding to a reverse surface of a mask 24, and a fine hole part 14 formed by boring a hole in a base board 10 part corresponding to a fine void or a pore 26 of the mask 24 by a high energy beam 30, by the ultrafine particle 36 separated from the mask, by obliquely irradiating such a mask 24 with the high energy beam 30, in a state of laminating and arranging the mask 24 having the fine void or the pore 26 on the base board 10 by separating a predetermined space 34. COPYRIGHT: (C)2005,JPO&NCIPI |
