发明名称 SUBSTRATE TREATMENT APPARATUS AND MANUFACTURING METHOD OF DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus by which the damage of an apparatus is avoided by fixing a main part and a base part without applying shock to the apparatus when large vibration is applied to the apparatus in the apparatus where the main part is mounted on the base part through an air mount etc. SOLUTION: The substrate treatment apparatus EX having the base 200 fixed to a floor F and the main part 150 supported separated from the base 200 concerning vibration, has: a fixing apparatus 340 which can elastically restrain movement in a second direction nearly orthogonal to a first direction and along the floor F, while permitting movement in the first direction along the floor part F of the main part 150 to the base 200; and a controller CONT for switching the restraining state and a non-restraining state of the fixing apparatus 340 according to the vibrating state of the floor part. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005166996(A) 申请公布日期 2005.06.23
申请号 JP20030404381 申请日期 2003.12.03
申请人 NIKON CORP 发明人 TAKAHASHI MASATO;YAMAMOTO KOJI
分类号 G03F7/20;F16F15/027;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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