SYSTEM AND METHOD FOR DRY ETCHING

摘要

PROBLEM TO BE SOLVED: To perform dry etching so that desired etching types can be obtained without causing any etching stop regardless of a material of an object to be etched. SOLUTION: On a lower electrode 102 in a reaction chamber 101, a substrate 150 to be treated is arranged and a focus ring 107 is arranged in such a manner as to surround the substrate to be treated. The focus ring 107 has a surface area in accordance with the quantity of carbon atoms generated by the object to be etched during etching. In concrete, the focus ring 107 is constituted by the combination of one or more rings selected from a plurality of rings that are prepared and have different radii (three rings 107a to 107c). COPYRIGHT: (C)2005,JPO&NCIPI