STAGE SYSTEM, EXPOSURE APPARATUS AND EXPOSURE METHOD

摘要

Disclosed is a state system (PST) comprising a holder (PH) having a substrate holding surface (33A) for holding a substrate (P), a stage (52) which moves while supporting the holder (PH), and a recovery unit (60) having lyophilic sections (3, 5) which are arranged near the holder (PH) and at least part of which has lyophilicity. The recovery unit (60) collects a liquid (1) using the lyophilic sections (3, 5). By having such a structure, the liquid is prevented from entering into the space between the substrate and the holder even when an exposure is carried out while filling the space between a projection optical system and the substrate with the liquid.