| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface protection film having flexibility and excellent in oxygen permeation resistant property and moisture permeation resistant property, which can be used for sealing an organic EL element. <P>SOLUTION: A plasma CVD device, having an upper electrode and a lower electrode arranged almost in parallel with each other in a reaction chamber, is used for forming the surface protection film. The surface protection film is formed by alternately laminating first silicon nitride films obtained by generating a plasma in a mixed gas (1) composed of a gas of a compound composed of 1 to 4 silicon atoms, 4 to 16 carbon atoms, and 1 to 4 nitrogen atoms, and a gas containing at least one kind out of H2, N2, and NH3, by supplying high frequency power on the upper electrode; and second silicon nitride films obtained by generating the plasma in a mixed gas (2) composed of a gas of a compound different from or same with the above compound, composed of 1 to 4 silicon atoms, 4 to 16 carbon atoms, and 1 to 4 nitrogen atoms, and a gas containing at least one kind out of H2, N2, and NH3, by supplying high frequency power on the lower electrode. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
