发明名称 NITRIDE SEMICONDUCTOR ELEMENT AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To achieve a reliable and efficient nitride semiconductor element by oscillating continuously for a long period of time at a room temperature by reducing the threshold of a laser element mainly made of a nitride semiconductor. SOLUTION: A first n-type nitride semiconductor layer in which n-type dopant is doped, or a metal layer made of n-type dopant is formed in contact with an active layer made of the nitride semiconductor containing indium. A second n-type nitride semiconductor layer in which the n-type dopant is doped in a smaller quantity than that of the first n-type nitride semiconductor layer is formed at a position separated from the active layer as compared with the first n-type nitride semiconductor layer. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005167282(A) 申请公布日期 2005.06.23
申请号 JP20050054879 申请日期 2005.02.28
申请人 NICHIA CHEM IND LTD 发明人 NAGAHAMA SHINICHI;NAKAMURA SHUJI
分类号 H01L21/205;H01S5/343;(IPC1-7):H01S5/343 主分类号 H01L21/205
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