发明名称 |
NITRIDE SEMICONDUCTOR ELEMENT AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To achieve a reliable and efficient nitride semiconductor element by oscillating continuously for a long period of time at a room temperature by reducing the threshold of a laser element mainly made of a nitride semiconductor. SOLUTION: A first n-type nitride semiconductor layer in which n-type dopant is doped, or a metal layer made of n-type dopant is formed in contact with an active layer made of the nitride semiconductor containing indium. A second n-type nitride semiconductor layer in which the n-type dopant is doped in a smaller quantity than that of the first n-type nitride semiconductor layer is formed at a position separated from the active layer as compared with the first n-type nitride semiconductor layer. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005167282(A) |
申请公布日期 |
2005.06.23 |
申请号 |
JP20050054879 |
申请日期 |
2005.02.28 |
申请人 |
NICHIA CHEM IND LTD |
发明人 |
NAGAHAMA SHINICHI;NAKAMURA SHUJI |
分类号 |
H01L21/205;H01S5/343;(IPC1-7):H01S5/343 |
主分类号 |
H01L21/205 |
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