发明名称 VACUUM DEPOSITION SYSTEM AND METHOD FOR SUPPLYING VAPOR DEPOSITION MATERIAL TO VACUUM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a vacuum deposition system capable of removing air and impurities in a vapor deposition material packed into a crucible in order to obtain a good-quality vapor deposition film in vacuum deposition and supplying the degassed vapor deposition material into the crucible disposed in an evaporation chamber in the state of maintaining the vacuum of the evaporation chamber of a vacuum deposition system and a method for supplying the vapor deposition material. SOLUTION: The vacuum deposition system comprises a housing vessel including a degassing port and degassing valve for removing the gas, such as air, from the the vapor deposition material housed in a housing vessel, a filling port and filling valve for filling the vapor deposition material into the housing vessel while removing the gas therefrom, and a supplying port and supplying valve for discharging the vapor deposition material filled into the housing vessel, a hermetic temporary storage vessel connectable with the housing vessel, and a vapor deposition material supplying section communicating with the crucible arranged in the evaporation chamber. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005163184(A) 申请公布日期 2005.06.23
申请号 JP20040376025 申请日期 2004.12.27
申请人 ROCK GIKEN KOGYO CO LTD 发明人 TAKAGI TOSHINORI;USUI HIROAKI;NAKAMURA HIROKI;KAWAGUCHI HARUHIKO
分类号 C23C14/24;(IPC1-7):C23C14/24 主分类号 C23C14/24
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