发明名称 |
Method of forming titanium film by CVD |
摘要 |
A Ti film is formed by CVD in holes formed in an insulating film formed on a Si substrate or on a Si film formed on a Si substrate by a method according to the present invenitioin. The method includes the steps of loading a Si substrate into a film forming chamber; evacuating the chamber at a predetermined vacuum; supplying TiCl<SUB>4 </SUB>gas, H<SUB>2 </SUB>gas, Ar gas and SiH<SUB>4 </SUB>gas into the film forming chamber; and producing a plasma in the film forming chamber to deposit a Ti film in the holes formed in the insulating film. The Si substrate is heated at 500° C. or below during the deposition of the Ti film. The flow rate of the SiH<SUB>4 </SUB>gas is from 30 to 70% of the flow rate of the TiCl<SUB>4 </SUB>gas. This method enables formation of a Ti film on a Si base at positions of holes in an insulating layer, with a good morphology of the interface between the Si base and the Ti film and with a good step coverage.
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申请公布号 |
US2005136660(A1) |
申请公布日期 |
2005.06.23 |
申请号 |
US20050028736 |
申请日期 |
2005.01.05 |
申请人 |
TADA KUNIHIRO;OTSUKI HAYASHI |
发明人 |
TADA KUNIHIRO;OTSUKI HAYASHI |
分类号 |
C23C16/04;C23C16/08;H01L21/768;(IPC1-7):H01L21/44;H01L21/302;H01L21/461 |
主分类号 |
C23C16/04 |
代理机构 |
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地址 |
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