| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method with which patterning with a high aspect ratio and high precision can be made possible. <P>SOLUTION: The pattern forming method includes a step of applying a photosensitive paste containing inorganic fine particles and organic components including a photosensitive compound as essential components, an exposing step, a developing step and a baking step, wherein a photosensitive paste whose total light transmittance with respect to 40 μm thickness at the exposure wavelength in the exposing step is ≥50% is used as the above photosensitive paste. Alternatively, the pattern forming method includes a step of applying a photosensitive paste containing inorganic fine particles and organic components including a photosensitive compound as essential components, an exposing step, a developing step and a baking step, wherein a photosensitive paste whose regular transmittance with respect to 40 μm thickness at the exposure wavelength in the exposing step is ≥10% is used as the above photosensitive paste. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
