发明名称 METHOD AND DEVICE FOR PLASMA TREATMENT
摘要 PROBLEM TO BE SOLVED: To provide method and device for plasma treatment capable of securing the safety of surrounding atmosphere by an inexpensive and compact constitution without necessitating any special exhaust system. SOLUTION: The plasma treatment device is provided with a stage 6 for arranging a treating object 5, a plasma injection nozzle 3 for injecting plasma to the mounting part of the treating object 5 on the stage 6, a cover 7 for forming a space 8 defined with respect to the outside atmospheric space under a condition that the tip end unit of the plasma injection nozzle 3 and the treating object 5 are comprised therein, a gas outflow port 12 formed on the cover 7 so as to communicate the inside of the space 8 with the atmospheric space, and a catalyst layer 10 arranged on the cover 7 so as to make harmful gas in the space 8 harmless and discharge it into the atmospheric space through the gas outflow port. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005166895(A) 申请公布日期 2005.06.23
申请号 JP20030402862 申请日期 2003.12.02
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 INOUE KAZUHIRO;TETSUYA TAKABUMI;KAJIYAMA MASAYUKI;MATSUMORI MASASHI
分类号 H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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