发明名称 |
MASK, METHOD OF PRODUCING MASK, METHOD OF PRODUCING ORGANIC EL APPARATUS, AND ORGANIC EL APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a mask having high reliability as a mask for vapor deposition or the like, and enabling a desired film pattern to be highly accurately deposited on a glass substrate or the like as an objective member for film deposition. SOLUTION: The mask is equipped with: a first substrate 10 provided with first opening parts 12; and a plurality of second substrates 20 provided with second opening parts 22 functioning as mask opening parts in the mask. The second opening parts 22 are arranged inside each first opening part 12, and the second substrates 20 are partially joined to the first substrate 10. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005163099(A) |
申请公布日期 |
2005.06.23 |
申请号 |
JP20030403070 |
申请日期 |
2003.12.02 |
申请人 |
SEIKO EPSON CORP |
发明人 |
KUWABARA TAKAYUKI;YOTSUYA SHINICHI |
分类号 |
C23C14/04;H01L51/50;H05B33/10;(IPC1-7):C23C14/04;H05B33/14 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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