发明名称 TRANSPARENT CONDUCTIVE FILM AND MANUFACTURING METHOD OF THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a transparent conductive film excellent in a gas barrier property, a manufacturing method of the same, a touch panel using the same, and an optical write-in type electronic paper. <P>SOLUTION: The transparent conductive film formed by successively laminating a resin curing material layer (a), a SiOx (1.6≤x≤1.9) film, a resin curing material layer (b), and a transparent conductive layer at least on one surface of a transparent polymer film has a steam permeability of 0.1 g/m<SP>2</SP>day or less, and either of the SiOx thin film and the transparent conductive film is formed by a magnetron sputtering method. The pressure of a film forming atmosphere for forming the SiOx thin film is 0.05 to 0.4 Pa. The manufacturing method of the transparent conductive film, the touch panel using the same, and the optical write-in type electronic paper are provided. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005166427(A) 申请公布日期 2005.06.23
申请号 JP20030403291 申请日期 2003.12.02
申请人 SUMITOMO BAKELITE CO LTD 发明人 MASUDA ATSUSHI
分类号 B32B7/02;B32B9/00;C23C14/06;G06F3/03;G06F3/033;G06F3/041;H01B5/14;H01B13/00;(IPC1-7):H01B5/14 主分类号 B32B7/02
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