APPARATUS AND METHOD FOR WASHING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a substrate drying apparatus that suppresses the consumption of a soluble organic solvent and efficiently dries a substrate without leaving a waterdrop trace. SOLUTION: Soluble organic solvent mist is produced by making the soluble organic solvent into mist with inert gas and sprayed on the surface of the substrate A through a plurality of atomizing nozzles 51. Each atomizing nozzle 51 begins to produce and spray soluble organic solvent mist before a specified time when the emission of a rinse ends. Rinse liquid sticking on the surface of the substrate A is replaced with the soluble organic solvent mist when the emission of the jet of the rinse liquid ends. A rotary holder 40 continues to rotate the substrate A for a specified time after the spraying of the soluble organic solvent mist by the atomizing nozzles 51 ends to centrifugally remove the soluble organic solvent mist sticking on the surface of the substrate A. COPYRIGHT: (C)2005,JPO&NCIPI