| 发明名称 |
Slurry for color photoresist planarization |
| 摘要 |
The present invention relates to a chemical mechanical abrasive slurry for polishing a color photoresist, comprising composite abrasive particles and an aqueous medium. The abrasive slurry of the present invention can effectively polish off horn-like protuberances color filter processing. |
| 申请公布号 |
US2005136669(A1) |
申请公布日期 |
2005.06.23 |
| 申请号 |
US20040848019 |
申请日期 |
2004.05.18 |
| 申请人 |
ETERNAL CHEMICAL CO., LTD. |
发明人 |
LEE CHIA-HAO;LIU WEN-CHENG;HUOH DENG-YANN |
| 分类号 |
B24B37/00;C09G1/02;C09K3/14;H01L21/302;H01L21/461;(IPC1-7):H01L21/302 |
主分类号 |
B24B37/00 |
| 代理机构 |
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| 主权项 |
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| 地址 |
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