| 摘要 |
PROBLEM TO BE SOLVED: To reliably prevent generation of particles while securing a substrate processing efficiency. SOLUTION: A coater unit 14 is configured so that a liquid supply unit 35 applies photoresist liquid to a substrate W transferred to a turntable 32 of a spin coater and a thin film is formed on the surface of the substrate W while the substrate W is rotated integrally with the turntable 32. The coater unit 14 is equipped with a nozzle cleaning unit 42 which cleans a photoresist liquid application nozzle 38 of the liquid supply unit 35, a table cleaner 75 which cleans a suction portion 33 of the turntable 32, and cup cleaning units such as an outer edge rinse nozzle 55 which cleans components such as a cup 34 of the spin coater. These cleaning units are operated in the normal mode or in the simple mode, which is predetermined by a coater unit control portion 101. COPYRIGHT: (C)2005,JPO&NCIPI
|
