CLEANING METHOD FOR SUBSTRATE TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To perform cleaning which reduces the damage of the members in a substrate treatment vessel due to an F free radical by using the conditions under which the F free radical recombines to form F2in cleaning using the F free radical. SOLUTION: The cleaning method for a substrate treatment apparatus comprising cleaning the treatment vessel of the substrate treatment apparatus for treating the substrate to be treated includes a process of exciting a plasma by maintaining the pressure in the treatment vessel under a first pressure while introducing cleaning gas at a first flow rate into a remote plasma generating section installed in the substrate treatment apparatus, and a cleaning process of removing the deposits in the treatment vessel by maintaining the pressure in the treatment vessel under a second pressure higher than the first pressure while introducing the cleaning gas at a second flow rate higher than the first flow rate into the remote plasma generating section. COPYRIGHT: (C)2005,JPO&NCIPI